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Lithography Process Control
Language: en
Pages: 210
Authors: Harry J. Levinson
Categories: Photography
Type: BOOK - Published: 1999 - Publisher: SPIE Press

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This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both
Advanced Processes for 193-nm Immersion Lithography
Language: en
Pages: 338
Authors: Yayi Wei
Categories: Art
Type: BOOK - Published: 2009 - Publisher: SPIE Press

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This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the
Run-to-Run Control in Semiconductor Manufacturing
Language: en
Pages: 367
Authors: James Moyne
Categories: Technology & Engineering
Type: BOOK - Published: 2018-10-08 - Publisher: CRC Press

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Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift
Printing-process Control and Standardization
Language: en
Pages: 0
Authors: Robert Chung
Categories: Color printing
Type: BOOK - Published: 2020 - Publisher: RIT Cary Graphic Arts Press

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"In Printing-Process Control and Standardization, Robert Chung explains the process of color printing with relevant examples related to measurement, process-con
Fundamental Principles of Optical Lithography
Language: en
Pages: 503
Authors: Chris Mack
Categories: Technology & Engineering
Type: BOOK - Published: 2011-08-10 - Publisher: John Wiley & Sons

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The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these p