An Investigation of Anisotropic Etching of Silicon in an Electron Cyclotron Resonance Plasma

An Investigation of Anisotropic Etching of Silicon in an Electron Cyclotron Resonance Plasma
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Total Pages : 200
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ISBN-10 : MSU:31293009001599
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Book Synopsis An Investigation of Anisotropic Etching of Silicon in an Electron Cyclotron Resonance Plasma by : Brian David Musson

Download or read book An Investigation of Anisotropic Etching of Silicon in an Electron Cyclotron Resonance Plasma written by Brian David Musson and published by . This book was released on 1991 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt:

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An Investigation of Anisotropic Etching of Silicon in an Electron Cyclotron Resonance Plasma
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Categories: Anisotropy
Type: BOOK - Published: 1991 - Publisher:

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Plasma etching using an electron cyclotron resonance (ECR) source has been used to study dry etching of SiC. Gas chemistries studied include C12/Ar, Cl2/ H2, SF