Multi-scale Simulations of Thin-film Metal Epitaxial Growth

Multi-scale Simulations of Thin-film Metal Epitaxial Growth
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Total Pages : 286
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ISBN-10 : OCLC:496805772
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Book Synopsis Multi-scale Simulations of Thin-film Metal Epitaxial Growth by : Valery Borovikov

Download or read book Multi-scale Simulations of Thin-film Metal Epitaxial Growth written by Valery Borovikov and published by . This book was released on 2008 with total page 286 pages. Available in PDF, EPUB and Kindle. Book excerpt: The main objective of the work presented in this thesis is to contribute to the understanding of how the growth conditions may affect the surface morphology during deposition. In thin film growth physical processes in a very wide range of time and length scales are relevant. A set of quite different methods of modeling is required when aiming at a more or less complete realistic picture of the growth process. Accordingly, both computer simulations/modeling and analytic calculations were employed in our studies of thin film growth. In particular, a hybrid multi-scale model, which combines a kinetic Monte Carlo (KMC) simulation for the thermal surface diffusion with a Molecular Dynamics (MD) simulation of deposition events, was developed and successfully employed to study Cu/Cu(100) growth at a range of substrate temperatures and deposition angles. Predictive capabilities of this model allowed us to explain a number of puzzling experimental observations. Another accomplishment presented in this thesis is an analytic calculation of the surface current and selected mound angle for the case of epitaxial growth on fcc(111) surface. The results of this calculation help to understand the morphologies observed experimentally for a wide range of systems and deposition conditions.

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